Updated on 2026/05/02

写真a

 
USUDA KOJI
 
Organization
Organization Organization for the Strategic Coordination of Research and Intellectual Properties Professor (non-tenured)
Title
Professor (non-tenured)
External link

Papers

  • Surface-pyramid-induced strain relaxation in (110)-oriented SiGe thin films revealed by Micro-Raman spectroscopy Reviewed

    Yuta Ito, Koji Usuda, Kiu Inami, Naoto Kumagai, Toshifumi Irisawa, Atsushi Ogura

    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING   209   2026.7

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1016/j.mssp.2026.110581

    Web of Science

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MISC

  • CVD-SiGe/Si(110)構造における SiGe 層の臨界膜厚のGe濃度依存性

    臼田宏治, 伊波希宇, 熊谷直人, 熊谷直人, 入沢寿史, 小椋厚志

    応用物理学会春季学術講演会講演予稿集(CD-ROM) 73th 2026年   2025.3

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    Authorship:Lead author   Language:Japanese   Publishing type:Meeting report  

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  • Anisotropy Analysis of SiGe Thin Film Grown on Si (110) Off-Angle Substrates by Chemical Vapor Deposition

    伊波希宇, 伊波希宇, 臼田宏治, 熊谷直人, 熊谷直人, 入沢寿史, 入沢寿史, 小椋厚志, 小椋厚志

    応用物理学会学術講演会講演予稿集(CD-ROM)   86th   2025

  • Strain Evaluation of Surface Roughness Effect in SiGe Epi. Thin Films on (110)Si Sub. by Raman Spectroscopy

    伊藤佑太, 伊藤佑太, 伊波希宇, 伊波希宇, 臼田宏冶, 小椋厚志, 小椋厚志

    応用物理学会学術講演会講演予稿集(CD-ROM)   86th   2025

  • Examination of Method for Evaluating Critical Thickness of SiGe/Si(110) Structures

    臼田宏治, 伊波希宇, 伊波希宇, 熊谷直人, 熊谷直人, 入沢寿史, 入沢寿史, 小椋厚志, 小椋厚志

    応用物理学会学術講演会講演予稿集(CD-ROM)   86th   2025

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    Authorship:Lead author  

    J-GLOBAL

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