Updated on 2026/03/07

写真a

 
MIURA NOBORU
 
Organization
Undergraduate School School of Science and Technology Associate Professor
Title
Associate Professor
External link

Degree

  • 博士(工学) ( 1992.3   明治大学 )

Research Areas

  • Manufacturing technology (mechanical,electrical/electronic, chemical engineering) / Electronic devices and equipment  / 電子デバイス・機器工学(Electron Devices and Apparatus Engineering)

  • Nanotechnology/Materials / Applied materials  / 応用物性・結晶工学(Applied Physics of Property and Crystallography)

Education

  • Meiji University   Graduate School, Division of Engineering

    1987.4 - 1992.3

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    Country/Region: Japan

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Papers

  • エレクトロルミネッセンス用蛍光体 -動作機構との関連性ー Invited Reviewed

    三浦登

    セラミックス   55 ( 12 )   855 - 858   2020.12

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  • Electroluminescence from impact excitation and carrier injection process in single device Reviewed

    Takatoshi Nishiguchi, Yuchi Onishi, Kunitoshi Yanagihara and Noboru MIura

    Japanese Journal of Applied Physics   58   SFBB02-1 - SFBB02-5   2019

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  • Effects of amorphous Si on DC electroluminescenct devices Reviewed

    Kunitoshi Yanagihara, Syoyo Unji, Takatoshi Nishiguchi and Noboru Miura

    Japanese Journal of Applied Physics   58   SFBB03-1 - SFBB03-5   2019

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  • Advantage of LED as Lighting Source for Plant Factory Reviewed

    Japanese Journal of Optics   46 ( 12 )   9 - 13   2017.1

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    Language:Japanese   Publishing type:Research paper (scientific journal)   Publisher:The Optical Society of Japan  

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  • Vertically Curved Si Waveguide Coupler with Low Loss and Flat Wavelength Window Reviewed

    Tomoya Yoshida, Emiko Omoda, Yuki Atsumi, Takashi Nishi, Syougo Tajima, Noboru Miura, Masahiko Mori, Youichi Sakakibara

    JOURNAL OF LIGHTWAVE TECHNOLOGY   34 ( 7 )   1567 - 1571   2016.4

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    DOI: 10.1109/JLT.2015.2506732

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  • Vertical silicon waveguide coupler bent by ion implatation Reviewed

    Tomoya Yoshida, Syougo Tajima, Ryohei Takei, Masahiko Mori, Noboru Miura, and Youichi Sakakibara

    OPTICAL EXPRESS   23 ( 23 )   29449   2015.10

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1364/O.E.23.029449

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  • Nonlinear Electrical Properties of Thin Films of a Light-Emitting Perovskite-Type Oxide Pr-0.002(Ca0.6Sr0.4)(0.997)TiO3 Reviewed

    Keiichi Ikegami, Ming Lu, Ryuzoh Ohon, Kimihiro Yonekawa, Noboru Miura, Hiroshi Takashima

    IUMRS INTERNATIONAL CONFERENCE IN ASIA 2011   36   388 - 395   2012

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    DOI: 10.1016/j.proeng.2012.03.057

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  • Highly transparent and flexible field emission devices based on single-walled carbon nanotube films

    Debasish Ghosh, Pradip Ghosh, Masaki Tanemura, Akari Haysahi, Yasuhiko Hayashi, Kawasaki Shinji, Noboru Miura, Mohd Zamri Yusop, Toru Asaka

    CHEMICAL COMMUNICATIONS   47 ( 17 )   4980 - 4982   2011

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    DOI: 10.1039/c0cc05677d

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  • Effects of Fluoride Dopants in the Starting Materials for BaAl2S4:Eu Thin-Film Phosphors

    Runhong Guo, Noboru Miura, Hironaga Matsumoto, Ryotaro Nakano

    JAPANESE JOURNAL OF APPLIED PHYSICS   49 ( 1 )   012401-1 - 012401-5   2010

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    DOI: 10.1143/JJAP.49.012401

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  • Perceptibility of environmental sounds by earphone wearers listening to pop and rock music

    Kazuhiro Hara, Saburo Nakano, Kaori Sato, Kaoru Ashihara, Shogo Kiryu, Noboru Miura

    Acoustical Science and Technology   31 ( 6 )   387 - 393   2010

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1250/ast.31.387

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  • Low-Driving-Voltage Electroluminescence in Perovskite Films

    Hiroshi Takashima, Kohei Shimada, Noboru Miura, Tetsuhiro Katsumata, Yoshiyuki Inaguma, Kazushige Ueda, Mitsuru Itoh

    ADVANCED MATERIALS   21 ( 36 )   3699 - +   2009.9

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    DOI: 10.1002/adma.200900524

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  • Inorganic Electroluminescent Display

    Expected Materials for the Future   9 ( 7 )   36-41   2009.7

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  • Preparation and evaluation of w03-bi2o3 composite thin films

    Koichi Nakagawa, Noboru Miura, Setsuko Matsumoto, Ryotaro Nakano, Hironaga Matsumoto

    Journal of the Vacuum Society of Japan   52 ( 3 )   159 - 162   2009

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    DOI: 10.3131/jvsj2.52.159

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  • Effect of electrical properties of platinum palladium oxide thin films on the optical properties

    Yuki Iwai, Koichi Nakagawa, Noboru Miura, Setsuko Matsumoto, Ryotaro Nakano, Hironaga Matsumoto

    Journal of the Vacuum Society of Japan   52 ( 3 )   163 - 166   2009

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    DOI: 10.3131/jvsj2.52.163

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  • Electrochromism and electronic structures of nitrogen doped tungsten oxide thin films prepared by RF reactive sputtering

    Koichi Nakagawa, Noboru Miura, Setsuko Matsumoto, Ryotaro Nakano, Hironaga Matsumoto

    JAPANESE JOURNAL OF APPLIED PHYSICS   47 ( 9 )   7230 - 7235   2008.9

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    DOI: 10.1143/JJAP.47.7230

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  • 無機ELディスプレイの最新技術動向

    電子材料5月号別冊 電子ディスプレイ技術2008・工業調査会   43-48   2008.4

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  • Preparation and evaluation of nitrogen doped tungsten oxide thin films

    Koichi Nakagawa, Noboru Miura, Setsuko Matsumoto, Ryotaro Nakano, Hironaga Matsumoto

    Journal of the Vacuum Society of Japan   51 ( 3 )   185 - 187   2008

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    DOI: 10.3131/jvsj2.51.185

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  • Flux Effects on BaAl2S4:Eu,F Blue Phosphors

    Runhong Guo, Noboru Miura, Hironaga Matsumoto, and Ryotaro Nakano

    Society for Information Display・SID 2007 International Symposium Digest of Technical Papers   XXXVIII   523-525 - 525   2007.5

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  • Optical Properties and Electronic Structure of Platinium Oxide Thin Films

    Hironaga Matsumoto, Yuki Iwai, Koichi Nakagawa, Toshiyuki Tsuda, Noboru Miura, Ryotaro Nakano, Setsuko Matsumoto

    Memoirs of The Institute of Science and Technology, Meiji University   45 ( 3 )   27-32   2007.3

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  • Luminescence Properties of Multinary-compound Phosphors for Inorganic Electroluminescence

    Noboru MIURA

    OYO Buturi   76 ( 3 )   252-257   2007.3

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  • Present Status and Prospects of Inorganic EL Materials

    Noboru MIURA

    Materials integration   20 ( 3 )   7-12 - 12   2007.3

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  • Optical Properties of Blue-Emitting BaAl2S4:Eu Thin-Films for Inorganic EL Display

    Guo Runhong, Noboru Miura, Hironaga Matsumoto, and Ryotaro Nakano

    Jornal of Rare Earths   24   119-121 - 121   2006.12

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    DOI: 10.1016/S1002-0721(07)60338-X

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  • Brightness Technology Clarifies Future Inorganic EL Displays

    Noboru MIURA

    Dempa Publication   53 ( 6 )   23-26   2006.6

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  • 無機ELディスプレイの最新技術動向

    三浦登

    工業調査会・「電子材料」5月号別冊 電子ディスプレイ技術2006   36-42   2006.4

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  • Optical properties of Palladium Oxide Thin Films Prepared by Reactive Sputtering

    Research Reports School of Science and Technology, Meiji University   ( 90(34) )   13-17 - 17   2006.3

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  • Optical Properties of Tungsten Oxide Thin Films Doped with Nitrogen

    Hironaga Matsumoto, Koichi Nakagawa, Noboru Miura, Ryotaro Nakano, Setsuko Matsumoto

    Memories of The Institute of Science and Technology, Meiji University   44 ( 2 )   9-15 - 15   2006.1

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    Tungsten oxide thin films doped with nitrogen were prepared by reactive rf magnetron sputtering in various oxygen-nitrogen-argon mixtures. The thin films were analyzed by RBS, XRD and XPS. Absorption spectra of the thin films in IR-VUV range and refractive indexes in VIS-UV range were measured. Remarkable doping effects of nitrogen were observed from XPS and optical measurements. It was found that the change of these optical properties originated in an occupied energy level above the valence band appeared by doped nitrogen.

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  • Effects of vacancies on the dielectric and piezoelectric properties of (Na0.5K0.5)NbO3-SrTiO3 solid solution

    Ruiping Wang, Norio Tachibana, Noboru Miura, Kotaro Hanada, Konio Matsusaki, Hiroshi Bando, Mitsuru Itoh

    FERROELECTRICS   331   135 - 139   2006

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    DOI: 10.1080/00150190600737693

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  • Capacitance temperature sensor using ferroelectric (Sr0.95Ca0.05)TiO3 perovskite

    K Shimada, H Takashima, RP Wang, B Prijamboedi, N Miura, M Itoh

    FERROELECTRICS   331   141 - 145   2006

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    DOI: 10.1080/00150190600737701

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  • 高輝度無機EL素子の開発動向

    三浦登

    株式会社 テクノタイムズ・月刊ディスプレイ   11 ( 9 )   50-55   2005.9

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  • 究極のFPD -無機ELディスプレイー

    三浦登

    SEAJ Jopurnal   ( 98 )   38-42   2005.9

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  • Inorganic Electroluminescent Display

    Noboru Miura

    The Journal of The Institute of Electronics, Information and Communication Engineers   88 ( 8 )   653-658   2005.8

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  • Ternary compound phosphor thin films for electroluminescent displays

    Noboru MIURA, Hironaga MATSUMOTO, Ryotaro NAKANO

    74 ( 5 )   617-621 - 621   2005.5

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    Significant progress has been achieved in the performance and commercialization of color thin film inorganic electroluminescent (EL) displays due to the advance of emitting materials and related technology. In particular BaAl2S4:Eu phosphor has cleared the highest obstacle for inorganic EL displays since it exhibits the high-luminance blue EL that had long been unobtainable. Many efficient phosphors, in the group of ternary and multinary sulfide compounds related to BaAl2S4:Eu have also been developed. In this paper, the principle of the material engineering behind these kinds of phosphors, the thin film process and EL performance are introduced

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  • 無機ELディスプレイの最新技術動向

    三浦登

    工業調査会・「電子材料」5月号別冊 電子ディスプレイ技術2005   41-46   2005.4

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    フルカラー化が絶望視されていた無機ELは、高輝度青色発光が達成され、厚膜誘電体を用いた構造、青色発光と色変換材料を組み合わせたカラー化なども開発された。34インチフルカラーディスプレイまで試作されている無機ELは、簡単な構造で生産性にも優れ、高品質・低価格を武器として、FPD市場の有力候補になりつつある。

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  • Preparation and optical properties of zirconium-titanium-oxide thin films by reactive sputtering

    H Matsumoto, M Sekine, N Miura, R Nakano, S Matsumoto

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS   44 ( 2 )   1013 - 1018   2005.2

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    DOI: 10.1143/JJAP.44.1013

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  • フラットパネルディスプレイの新展開

    三浦登

    日本真空工業会・真空ジャーナル   ( 98 )   15-17   2005.1

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  • 会議速報 「第12回ELワークショップ報告」

    電子材料(工業調査会 発行) 2004年12月号 43巻12号 pp90-91.

    2004.12

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  • Electroluminescence

    Noboru Miura

    The Society of Inorganic Materials, Japan   11 ( 313 )   433 - 438   2004.11

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    Language:Japanese   Publishing type:Research paper (scientific journal)   Publisher:The Society of Inorganic Materials, Japan  

    DOI: 10.11451/mukimate2000.11.433

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  • Annealing Study for Color EL Devices

    Noboru MIURA

    Conference Proceedings of 12th International Workshop on Inorganic and Organic Electroluminescence & 2004 International Conference on the Science and Technology of Emissive Displays and Lighting   77-79   2004.9

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    To avoid the damage on the high temperature annealing for blue-emitting BaAl2S4:Eu phosphor films, some technique were studied. With Rapid thermal annealing, high luminance was observed without glass bending of substrate, although it is necessity to crystallize phosphor film over 700 °C. To decrease the annealing temperature, flux material was co-evaporated. This method was quite effective. To avoid the thermal damage, electron-beam annealing and laser annealing was studied.

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  • Color Phosphors for Inorganic Electroluminescent Devices

    Noboru Miura

    Society for Information Display 2004 International Symposium Digest of Technical Papers   XXXV   1142-1145   2004.5

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  • Electrical properties of β-FeSi2/Si Hetero-Diode Improved by Pulsed Laser Annealing

    Keiichi Tsuchiya, Noboru Miura, Hironaga Matsumoto, Ryotaro Nakano, and Shin-ichiro Uekusa

    Material Research Society・Symposium Proceedings   799   133-138 - 138   2004

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  • New red-emitting CaY2S4 : Eu thin-film electroluminescent devices

    M Kawanishi, N Miura, H Matsumoto, R Nakano

    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS   42 ( 1A-B )   L42 - L43   2003.1

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    DOI: 10.1143/JJAP.42.L42

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  • Composition of β-FeSi2 Thin-films Grown by a Pulsed Laser Deposition Method

    Shin-ichiro Uekusa, Masahiro Yamamoto, Keiichi Tsuchiya and Noboru Miura

    Material Research Society・Symposium Proceedings   744   309-312 - 314   2003

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  • 無機EL赤色蛍光体

    化学工業日報 2002年12月6日

    2002.12

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  • New II-Y2-S4 Phosphors for Electroluminescent Devices

    Mitsuhiro Kawanishi, Noboru Miura, Hironaga Matsumoto and Ryotaro Nakano

    Society for Information Display (SID)・Proceedings of The Ninth International Display Workshops (IDW'02)   1407-1408   2002.12

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  • 高輝度青色発光素子の開発動向

    三浦登

    技術情報協会・マテリアルステージ   2 ( 7 )   23-29   2002.10

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  • Possibility of RGB Emission by Eu2+ ion doped IIa-IIIb2-S4 phosphors for Full Color Inorganic Electroluminescent Displays

    Mitsuhiro Kawanishi, Yoshiaki Ono, Ryo Nakagawa, Noboru Miura, Hironaga Matsumoto and Ryotaro Nakano

    Proceedings of 11th International Workshop on Inorganic and Organic Electroluminescece & 2002 International Conference on the Science and Technology of Emissive Displays and Lighting   2002.9

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  • Mn2+ and Eu2+ Doped Barium Zinc Sulfide Phosphors

    Ryo Nakagawa, Yuichi Kinoshita, Mitsuhiro Kawanishi, Noboru Miura, Hironaga Matsumoto and Ryotaro Nakano

    Proceedings of 11th International Workshop on Inorganic and Organic Electroluminescece & 2002 International Conference on the Science and Technology of Emissive Displays and Lighting   2002.9

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  • Improved luminous efficiency of blue-emitting BaAl2S4:Eu electroluminescent devices

    Mitsuhiro Kawanishi, Noboru Miura, Hironaga Matsumoto, Ryotaro Nakano

    The Institute of Image Information and Television Engineers・The Journal of the Institute of Image Information and Television Engineers   56 ( 8 )   1273-1278 - 1278   2002.8

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    We have enhanced the luminous efficiency of blue emitting BaAl<SUB>2</SUB>S<SUB>4</SUB> : Eu thin-film electroluminescent (TFEL) devices decreasing the amount of oxygen impurities in the thin film and the leakage current of the TFEL device. The luminous efficiency of the device was increased to 0.19lm/W at 30 volts above the threshold voltage.

    DOI: 10.3169/itej.56.1273

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    Other Link: https://jlc.jst.go.jp/DN/JALC/00158244561?from=CiNii

  • Recent R&D Trends and Future EL DIsplay challenges

    Noboru Miura

    44 ( 9 )   17-20   2002.7

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  • Crystallographic and Iuminescent charcterization of blue-emitting BaAl2S4:Eu electroluminescent thin films

    Isao Tanaka, Youji Inoue, Katsu Tanaka, Yoshitaka Izumi, Shinji Okamoto, Mitsuhiro Kawanishi, Noboru Miura, Hironaga Matsumoto and Ryotaro Nakano

    Elsevier ・ Journal of Luminescence   96 ( 1 )   69-74 - 74   2002.1

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    DOI: 10.1016/S0022-2313(01)00214-9

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  • Evaluation of hafnium-titanium-oxide thin films prepared by reactive sputtering

    Hironaga Matsumoto, Kimio Ando, Noboru Miura, Ryotaro Nakano

    Shinku/Journal of the Vacuum Society of Japan   45 ( 1 )   18 - 25   2002

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    DOI: 10.3131/jvsj.45.18

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  • Preparation of Efficient Blue Emitting BaAl2S4:Eu Thin Films without High Temperature Annealing

    Mitsuhiro Kawanishi, Noboru Miura, Hironaga Matsumoto and Ryotaro Nakano

    Society for Information Display (SID)・Proceedings of The 21st International Display Research Conference in conjunction with The 8th International Display Workshop(ASIA DISPLAY / IDW'01)   1075-1078   2001.10

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  • 無機ELディスプレイの最新技術と将来展望

    三浦登

    工業調査会・国際技術情報誌『M&E』   28 ( 11 )   152-156   2001.10

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  • BaAl2S4:Eu Phosphor for Full-Color EL Display

    Noboru Miura

    Society for Information Display (SID)・Proceedings of The 21st International Display Research Conference in conjunction with The 8th International Display Workshop (ASIA DISPLAY / IDW'01)   1059-1062   2001.10

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  • Prepareation and evaluation of zirconium oxide thin films doped with titanium by reactive sputtering method

    Hironaga Matsumoto, Masato Sekine, Noboru Miura and Ryotaro Nakano

    25(81) ( 25 )   1-9 - 9   2001.9

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  • 悲願の青色発光-BaAl2S4:Eu青色蛍光体薄膜からの高輝度EL-

    三浦登

    テクノタイムズ・月刊ディスプレイ   7 ( 9 )   53-58   2001.9

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  • Present Status and Prospects of Inorganic EL Devices

    Noboru Miura

    Materials Integration Electronic Ceramics   14 ( 9 )   41-45   2001.9

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  • Atomic Composition and Structural Properties of Blue Emitting BaAl2S4:Eu Electroluminescent Thin Films

    Youji Inoue, Isao Tanaka, Katsu Tanaka, Yoshitaka Izumi, Mitsuhiro Kawanishi, Daisuke Barada, Noboru Miura, Hironaga Matsumoto, Ryotaro Nakano

    応用物理学欧文誌刊行会・Japanease Journal of Applied Physics   40 ( 4A )   2451-2455 - 2455   2001.4

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    DOI: 10.1143/JJAP.40.2451

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  • Crystallization of thin-film phosphors by new annealing technique

    Mitsuhiro Kawanishi, Noboru Miura, Hironaga Matsumoto and Ryotaro Nakano

    Proceedings of the 10th international workshop on inorganic and organic electroluminescence (EL'00)   121-124   2000.12

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  • Blue-emitting BaAl2S4:Eu2+ thin film EL devices

    Noboru Miura

    Proceedings of the 10th international workshop on inorganic and organic electroluminescence (EL'00)   465-470   2000.12

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  • Composition and luminescent properties of blue-emitting BaAl2S4:Eu electroluminescent thin films

    Isao Tanaka, Youji Inoue, Shinji Okamoto, Katsu Tanaka, Yoshitaka Izumi, Mitsuhiro Kawanishi, Noboru Miura, Hironaga Matsumoto and Ryotaro Nakano

    Proceedings of the 10th international workshop on inorganic and organic electroluminescence (EL'00)   125-128   2000.12

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  • Blue-Emitting BaAl2S4:Eu Thin-Film Electroluminescent Devices Prepared by Two Targets Pulse Electron Beam Evaporation

    Noboru Miura, Mitsuhiro Kawanishi, Hironaga Matsumoto and Ryotaro Nakano

    The Institute of Electronics, Information and Communication Engineers ・ IEICE Transactions on Electronics   E83-C ( 10 )   1618-1621 - 1621   2000.10

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  • 無機EL素子の挑戦-高輝度青色発光素子-

    三浦登

    テクノタイムズ・月刊ディスプレイ   6 ( 9 )   53-58   2000.9

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  • β-FeSi2 thin-films grown by a pulsed laser ablation method

    Shin-ichiro Uekusa, Yasuharu Watanabe, Noboru Miura and Yasuhiro Aida

    Proceeding of Japan-UK joint workshop on ecologically friendly semiconductors   77-79   2000.8

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  • Optical Properties of the Hafnium doped vanadium oxide thin-films prepared by RF reactive sputtering

    Hironaga Matsumoto, Yusuke Ato, Noboru Miura, Ryotaro Nakano

    Memoirs of the institute of science and technology, Meiji University   39 ( 8 )   61-68 - 68   2000.3

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    The hafnium doped vanadium oxide thin films are deposited by reactive rf magnetron sputtering from two metallic targets of the vanadium and the hafnium in the argon-oxygen gas mixture atmosphere. The FE-SEM photograph of the vanadium oxide films has a smooth surface and a cross-section of the columnar structure. In the hafnium rich samples, the columnar structure disappears. The x-ray diffraction patterns of the vanadium oxide films are confirmed in the vanadium pentoxide and those of the hafnium rich samples in the amorphous state. The emission peaks at 514eV and 521.5eV in the x-ray photoelectron spectroscopy of the hafnium doped vanadium oxide thin films are assigned V(2p3/2) and V(2p1/2) energy levels caused by the spin-orbit splitting in the vanadium pentoxide. The concentration of the hafnium atom and the stoichiometry for the hafnium doped vanadium oxide thin films are determined by the Rutherford back scattering spectra. The refractive index of the hafnium doped vanadium oxide thin films decreased linearly with doping the hafnium. The decreasing of the refractive index was caused by the increasing of the single oscillator energy E. and by the decreasing of the dispersion energy E_J in the single oscillator model.

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  • Eu 2+-doped barium thioaluminate EL devices prepared by two-target pulsed-electron-beam evaporation

    Mitsuhiro Kawanishi, Noboru Miura, Hironaga Matumoto, Ryotaro Nakano

    Journal of the Society for Information Display   8 ( 3 )   247 - 251   2000

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    DOI: 10.1889/1.1828758

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  • β-FeSi2 thin-films-grown by a pulsed laser deposition method

    Shin-ichiro Uekusa, Yasuharu Watanabe, Noboru Miura, Ysuhiro Aida

    Material Research Society・Symposium Proceedings   ???   ??-??   2000

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  • Blue Emitting BaAl2S4:Eu TFEL Devices Prepared by Two Targets Pulse Electron Beam Evaporaton

    Mitsuhiro Kawanishi, Noboru Miura, Hironaga Matsumoto and Ryotaro Nakano

    Society for Information Display (SID)・Proceedings of the sixth international display workshops(IDW'99)   821-824   1999.12

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  • High-Luminance Blut-Emitting BaAl2S4:Eu Thin-film Electroluminescent Devices

    Noboru Miura, Mitsuhiro Kawanishi, Hironaga Matsumoto and Ryotaro Nakano

    応用物理学欧文誌刊行会・Jpnease Journal of Applied Physics   38 ( 11B )   L1291-L1292 - L1292   1999.11

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    DOI: 10.1143/JJAP.38.L1291

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  • Eu concentration dependence of excitation and emission spectra in BaF2:Eu single crystals

    Hironaga Matsumoto, Toshifumi Suda, Noboru MIura and Ryotaro Nakano

    16(72) ( 16 )   23-30 - 30   1997.3

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  • Electroluminescence Spectra for Tb3+ doped ZnrxCdxS thin-films

    Noboru Miura, Teruhiko Namiki, Hironaga Matsumoto and Ryotaro Nakano

    Elsevier ・ Journal of Luminescence   72-74   999-1001 - 1001   1997

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    DOI: 10.1016/S0022-2313(96)00326-2

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  • Electroluminescenct devices of electron-beam evaporated II-III2VI4 hosts

    Noboru Miura, Akira Ogura, Katsuhiro Ohashi, Teruhiko Namiki, Hironaga Matsumoto and Ryotaro Nakano

    Science Press・Proceedings of 1994 International Workshop on Electroluminescence   1994

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  • Electroluminescent Spectra of rare-earth-doped ZnS1-x Sex thin films

    Noboru Miura, Kiyoshi Ogawa, Shuko Kobayashi, Hironaga Matsumoto and Ryotaro Nakano

    Elsevier ・ Journal of Crystal Growth   138 ( 1-4 )   1046-1050 - 1050   1994

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    DOI: 10.1016/0022-0248(94)90953-9

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  • Blue-emitting EL Materials : Several Host Materials

    Noboru Miura, Hironaga Matsumoto and Ryotaro Nakano

    Display and Imaging   3   195-201   1994

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  • Blue Emitting CaF2:Eu Thin Film Electroluminescent Device

    Toshiyuki Oka, Noboru Miura, Hironaga Matsumoto and Ryotaro Nakano

    Research Reports, School of Science and Technology, Meiji University   8(64) ( 8 )   1-7 - 7   1993.3

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  • Dependence of Excitation Pulse Width for the Emission Spectra in ZnS:Er,Yb Thin Film Electroluminescent Devices

    Takashi Sasaki, Noboru Miura, Hironaga Matsumoto and Ryotaro Nakano

    Research Reports, School of Science and Technology, Meiji University   8(64) ( 8 )   9-13 - 13   1993.3

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  • Electroluminescence for CdF2 and ZnF2 Thin-Film Doped with Rare Earth Ions

    Takashi Sasaki, Noboru Miura, Hironaga Matsumoto and Ryotaro Nakano

    Research Reports, School of Science and Technology   8(64) ( 8 )   15-22 - 22   1993.3

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  • Excitation process for AC thin film electroluminescent devices doped with localized emission center

    Noboru Miura

    7(63)   31-62   1993.1

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  • Effects of UV light irradiation on ZnS:TbFx thin film electroluminescent devices

    Yoichiro Yamamoto, Noboru Miura, Takashi Sasaki, Hironaga Matsumoto and Ryotaro Nakano

    5(61) ( 5 )   49-62 - 62   1992.3

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  • Blue emitting electroluminescence in ZnS:Tm3+ thin films

    Hiroshi Ohata, Noboru Miura, Tetsuo Ishikawa, Toshiyuki Oka, Hironaga Matsumoto and Ryotaro Nakano

    5(61) ( 5 )   29-35 - 35   1992.3

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  • Electroluminescence from Y2O2S:Eu thin films

    Hiroshi Ohata, Noboru Miura, Tetsuo Ishikawa, Toshiyuki Oka, Hironaga Matsumoto and Ryotaro Nakano

    5(61) ( 5 )   37-41 - 41   1992.3

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  • Transient Behavior in ZnS:TbFx Thin-Film Electroluminescent Devices Excited by Very Short Pulse

    Noboru Miura, Hiranaga Matsumoto and Ryotaro Nakano

    応用物理欧文誌刊行会・Japanease Journal of Applied Physics   31 ( 2A )   288-294 - 294   1992.2

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  • Band-Gap Energy Dependence of Emission Spectra in Rare Earth-Doped Zn(1-x)CdxS Thin-Film Electroluminescent Devices

    Noboru Miura, Takashi Sasaki, Hironaga Matsumoto and Ryotaro Nakano

    応用物理欧文誌刊行会・Japanease Journal of Applied Physics   31 ( 2A )   295-300 - 300   1992.2

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  • Several Blue-Emitting Thin-Film Electroluminescent Devices

    Noboru Miura, Tetsuo Ishikawa, Takashi Sasaki, Toshiyuki Oka, Hiroshi Ohata, Hironaga Matsumoto and Ryotaro Nakano

    応用物理学欧文誌刊行会・Japanese Journal of Applied Physics   31 ( 1A/B )   L46-L48 - L48   1992.1

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  • Electroluminescence of ZnF_2 Thin-Films Doped with Rare-Earth Ions

    Noboru Miura, Takashi Sasaki, Hironaga Matsumoto and Ryotaro Nakano

    応用物理学欧文誌刊行会・Japanese Journal of Applied Physics   31 ( 1 )   51-59 - 59   1992.1

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    DOI: 10.1143/JJAP.31.51

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  • Band-Gap Energy Dependence of Host Materials for Electroluminescent Spectra

    Noboru Miura, Kiyoshi Ogawa, Takashi Sasaki, Tetsuo Ishikawa, Toshiyuki Oka, Hironaga Matsumoto and Ryotaro Nakano

    CINKO PUNTOS PRESS・Electroluminescence   404-409 - 409   1992

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  • Strong Ultraviolet-Emitting ZnF2:Gd Thin Film Electroluminescent Device

    Noboru Miura, Takashi Sasaki, Hironaga Matsumoto and Ryotaro Nakano

    応用物理欧文誌刊行会・Japanease Journal of Applied Physics   30 ( 10B )   L1815-L1816 - L1816   1991.10

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  • ZnS:CeClx薄膜エレクトロルミネッセンス素子における発光の過渡的振舞

    山本陽一郎*(大学院生), 三浦登*(大学院生), 松永浩永(助手), 中野鐐太郎(教授)

    明治大学理工学部・明治大学理工学部研究報告   3(59) ( 3 )   31-36 - 36   1991.3

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  • Transient Characteristics of Emission in ZnS : Mn Thin-Film Electroluminescent Devices

    Noboru Miura, Hironaga Matsumoto and Ryotaro Nakano

    Society for Information Display (SID)・Proceedings of the Society for Information Display   32 ( 3 )   219-222   1991

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  • Transient behavior in ZnS:TbFx thin film electroluminescent devices

    Noboru Miura, Yoichiro Yamamoto, Hironaga Matsumoto and Ryotaro Nakano

    2(58)   25-32   1990.4

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  • Li+1イオンを共付活したZnS:EuFx薄膜EL素子

    三浦登*(大学院生), 大畑浩*(大学院生), 松永浩永(助手), 中野鐐太郎(教授)

    明治大学理工学部・明治大学理工学部研究報告   1(57) ( 1 )   39-44 - 44   1990.3

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  • Transient Behavior of Photoluminescence and Electroluminescence in ZnS Thin Film Deped with Tb3+ion

    Noboru Miura, Hironaga Matsumoto and Ryotaro Nakano

    Finnish Academy of TechnologyActa Polytechnica Scandinavica   170 ( 170 )   241-244 - 244   1990

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  • Transient characteristics of emission in ZnS:Mn thin film electroluminescent devices

    Noboru Miura, Hironaga Matsumoto and Ryotaro Nakano

    Society for Information Display (SID)・Proceedings of the 9th international display research conference (JAPAN Display '89)   70-73   1989.10

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  • ZnS薄膜エレクトロルミネッセンス素子の発光過渡特性における発光層の熱処理温度依存

    三浦登*(大学院生), 松永浩永(助手), 中野鐐太郎(教授)

    明治大学科学技術研究所・明治大学科学技術研究所紀要   27 ( 9 )   69-78   1989.3

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  • Emission Properties in Thin Film ZnS Electroluminescent Devices

    Jun Shimada, Tadao Endo, Noboru Miura, Hironaga Matsumoto and Ryotaro Nakano

    56 ( 56 )   33-38 - 38   1989.1

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  • Fabrication of the alternating pulse generator for excitation of electroluminescent devices

    Norio Sakagami, Noboru Miura, Hironaga Matsumoto and Ryotaro Nakano

    56 ( 56 )   27-32 - 32   1989.1

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    To investigate the excitation mechanisms of emission center in electroluminescent devices, the alternating pulse generater which has very narrow pulse width was designed and fablicated. Time resolved emission spectra and time responces of the doubly insulated thin-film electroluminescent devices having electron-beam evaporated undoped ZnS and ZnS:TbFx as the active layer were measured with 500 ns pulse width at 12.5 Hz by the fabricated apparatus. From obtained results, transient behavior of emission were discussed.

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  • Time Resolved Emission Spectra in ZnS Thin Film Electroluminescent Devices

    Noboru Miura, Hironaga Matsumoto and Ryotaro Nakano

    Springer-Verlag・Springer Proceedings in Physics 38 Electroluminescence   44-47   1989

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  • Broad Band Emission Behaviors in ZnS Thin Film Electroluminescent Devices

    Ryotaro Nakano, Hironaga Matsumoto, Tadao Endo, Jun Shimada, Norio Sakagami and Noboru Miura

    応用物理欧文誌刊行会・Japanease Journal of Applied Physics   27 ( 11 )   L2103-L2104 - L2104   1988.11

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Books

  • 植物工場生産システムと流通技術の最前線

    ( Role: Joint author植物工場用新規光源の開発)

    株式会社エヌ・ティー・エス  2013.4  ( ISBN:9784864690614

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    Responsible for pages:51-58   Language:Japanese   Book type:Scholarly book

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  • レアメタル便覧

    足立吟也 他( Role: Joint author)

    丸善  2011.1 

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    Responsible for pages:379-391   Language:Japanese   Book type:Scholarly book

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  • FPDの比較と製造プロセス

    三浦登他( Role: Joint author)

    株式会社 情報機構  2008.5 

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    Responsible for pages:379-391   Language:Japanese   Book type:Scholarly book

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  • FPDの比較と製造プロセス

    ( Role: Joint author)

    株式会社 情報機構  2008.5 

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  • 希土類の材料技術ハンドブック

    足立吟也, 國本崇, 中西洋一郎, 坂野晋, 三浦登, 他122人( Role: Joint author)

    株式会社エヌ・ティー・エス  2008.5 

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    Responsible for pages:54-60   Language:Japanese   Book type:Scholarly book

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  • 発光と受光の物理と応用

    日本学術振興会 光電相互変換第125委員会編 小林洋志 監修 中西洋一郎・波多腰玄一 編著 小林洋志・國本崇・斉藤博・川上養一・大観光徳・小林正和・三村秀典・三浦登・他30名( Role: Joint author)

    培風館  2008.3 

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    Responsible for pages:"75-88, 357-366"   Language:Japanese   Book type:Scholarly book

    多元系硫化物EL材料・無機ELディスプレイ

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  • ラボレベル・研究開発初期で必要となる発光素子、発光デバイス開発のための基礎技術・装置・測定・評価法

    戸田健司・藤原忍・山田浩志・河本康太郎・三浦登・他19人( Role: Joint author)

    情報機構  2008.3 

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    Responsible for pages:101-121   Language:Japanese   Book type:Scholarly book

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  • 薄膜ハンドブック(第2版)

    吉田貞史他( Role: Joint author)

    株式会社オーム社  2008.3 

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    Responsible for pages:772-777   Language:Japanese   Book type:Scholarly book

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  • FPD・DSSC・光メモリーと機能性色素の最新技術と材料開発

    ( Role: Joint author)

    技術教育出版社  2008.1 

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    Responsible for pages:470-483   Language:Japanese   Book type:Scholarly book

    第8編 LED・無機EL・プロジェクタ
    第2章 無機ELディスプレイの最新技術と材料開発

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  • 無機EL開発動向

    三浦登・岡本信治・南内嗣・矢澤哲夫・植田和茂・山中明生・峯元高志・田中滋・石川由加里・柴田典義・森茂龍一・佐藤利文・大観光徳・平川洋平・上村明・大西秀臣・田口信義・片山雅之・和迩浩一( Role: Joint author)

    情報機構  2007.3 

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    Responsible for pages:1-32   Language:Japanese   Book type:Scholarly book

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  • PHOSPHOR HANDBOOK Second Edition

    ( Role: Joint author)

    CRC Press (Taylor & Francis Group)  2007.1 

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    Responsible for pages:687-720   Language:English   Book type:Scholarly book

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  • 図解電子ディスプレイのすべて

    株式会社 工業調査会  2006.10 

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    Responsible for pages:268-272   Language:Japanese   Book type:Scholarly book

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  • ナノマテリアル工学大系 第1巻ニューセラミックス・ガラス

    株式会社 フジ・テクノシステム  2005.10 

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    Responsible for pages:789-792   Language:Japanese   Book type:Scholarly book

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  • 高効率希土類蛍光体とその応用

    安藤昌儀 他27名

    株式会社 ティー・アイ・シィー  2005.1 

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    Responsible for pages:149-158   Language:Japanese   Book type:Scholarly book

    第5章 無機EL素子と希土類蛍光体
    第1節 無機EL素子の現状と動向

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  • 有機ELディスプレイの最新技術動向

    三浦登

    株式会社 情報機構  2003.4 

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    Responsible for pages:54-64   Language:Japanese   Book type:Scholarly book

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Presentations

  • Nb:SrTiO<SUB>3</SUB>を用いたキャリヤ密度傾斜薄膜における熱応答および光応答の評価

    秋谷昌吾, 三浦登

    2023年 日本セラミックス協会年会  2023.3  日本セラミックス協会

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    Event date: 2023.3

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  • ZnO:Al を用いたキャリヤ密度傾斜薄膜における熱応答および光応答の評価

    山田 佳周・三浦 登

    2021年 日本セラミックス協会年会  2021.3  日本セラミックス協会

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    Event date: 2021.3

    Language:Japanese   Presentation type:Poster presentation  

    Venue:オンライン  

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  • エレクトロルミネッセンス素子の進展と課題 Invited

    第385回蛍光体同学会講演会  2021.11  蛍光体同学会

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    Venue:オンライン  

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  • P型半導体を用いた直接衝突励起型直流EL素子の試作

    三浦登 柳原邦俊

    第379回蛍光体同学会講演会  2020.2  蛍光体同学会

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    Venue:東京  

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  • Thermoelectric and photoelectric characteristics of graded films using Nb-doped SrTiO<SUB>3</SUB> International conference

    Tatsuhiko Inomoto and Noboru Miura

    The Pacific Rim Conference of Ceramic Societies 13  2019.10  The American Ceramic Society, The Ceramic Society of Japan, The Chinese Ceramic Society, The Korean Ceramic Society and The Australian Ceramic Society

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    Venue:Okinawa  

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  • Effects of anode-side-CeO<SUB>2</SUB> layer on characteristics of DC-EL device

    2019.9 

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  • 亜酸化銅を用いた直流 EL 素子からの低電圧発光

    柳原邦俊 三浦登

    第80回応用物理学会秋季学術講演会  2019.9  応用物理学会

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    Venue:北海道  

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  • 電機がつくる農業 Invited

    三浦登

    応用科学会 講演会  2019.2  応用科学会

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  • PLD法により作製されたCa0.6Sr0.4TiO3:Prを発光層とするEL素子の電気的特性

    青木光子, 池上敬一, 米川公博, 三浦登, 高島浩

    第61回応用物理学会春季学術講演会  2014.3  応用物理学会

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  • Vertical Light Coupling Between Silicon Vertically-Curved Waveguide and Optical Fiber

    2014.3 

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  • Silicon wire waveguide based optical switching device employing IPS liquid crystal

    2014.3 

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  • 簡易なプロセスにより酸化物蛍光体を発光層に用いたセラミックスEL素子の検討

    本多勇輝, 三浦登, 松本皓永

    日本セラミックス協会2014年年会  2014.3  日本セラミックス協会

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  • Study of Carrier injection light-emitting devices using D-A Pair phosphor

    2014.1 

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  • Electroluminescence from DC Biased ZnS:TbF3 Phosphor Layers Having Oxide Semiconductor

    K. Yanagihara, N. Miura, H. Matsumoto

    The 20th International Display Workshops (IDW'13)  2013.12  Society for Information Display

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  • ペロブスカイト型酸化物蛍光体ナノ粒子を用いた粉末型EL素子

    中川裕希, 三浦登, 伯田幸也, 青木光子, 高島浩

    第26回日本セラミックス協会秋季シンポジウム  2013.9 

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  • Vertically-Curved Silicon Waveguide Fabricated by Ion-Induced Bending Method for Vertical Light Coupling

    T. Yoshida, T. Nishi, S. Tajima, R. Takei, M. Suzuki, E. Omoda, M. Nagao, N. Miura, M. Mori, and Y. Sakakibara1, 2

    The 10th International Conference on Group IV Photonics  2013.8  IEEE Photonics Society

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  • The Present Status and Future Prospects of Display Research

    2013.7 

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  • 酸化物半導体薄膜を用いた直流無機薄膜 EL 素子のアニール温度依存性

    岡本正伸,三浦登

    第60回応用物理学会春季学術講演会  2013.3  応用物理学会

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  • 量子効率測定による無機EL素子における発光特性の検討

    岩田祐磨,堀口朋希,三浦登,松本皓永

    第60回応用物理学会春季学術講演会  2013.3  応用物理学会

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  • 市販200V級GaN-HEMTとSi-SJMOSFETのスイッチング損失分析

    南智也,長南紘志,井手利英,清水三聡,三浦登

    第60回応用物理学会春季学術講演会  2013.3  応用物理学会

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  • Epitaxial growth of ferromagnetic semiconductor Ga1-xMnxAs films on Ge(001) substrate

    Yuki Sato, Aurélie Spiesser,Hidekazu Saito, Sinji Yuasa, K. Ando, Noboru Miura

    The 60th JSAP Spring Meeting, 2013  2013.3  応用物理学会

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  • 無機EL素子の内部量子効率に与えるホットエレクトロンの振舞い

    堀口朋希, 岩田祐磨, 三浦登, 松本皓永

    2013年 日本セラミックス協会年会  2013.3  日本セラミックス協会

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  • Thin film perovskite electroluminescence with ferroelectric BaTiO3 films as insulating layers

    Hiroshi Takashima and Noboru Miura

    The 19th International Display Workshops (IDW2012)  2012.12  Society of Information Display

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  • Switching Loss Analysis of Commercial 200V class GaN-HEMT and Si-Superjunction MOSFET

    21st Meeting on SiC and Related Wide Bandgap Semiconductors  2012.11 

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  • Luminescence Properties of Perovskite Oxide Thin-Film Phosphors

    Kimihiko Yonekawa, Yuuki Nakagawa, Noboru Miura, Hiroshi Takashima

    International Symposium on Rare Earth in 2012  2012.11  The Rare Earth Society of Japan

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  • Electroluminescence of BaSO4:Eu Thin-Film Phosphors

    Ryo Morita and Noboru Miura

    International Symposium on Rare Earths in 2012  2012.11  The Rare Earth Society of Japan

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  • Ceramic EL device using Submicron Sized Oxide Phosphors

    2012.9 

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  • 局在型発光中心を用いたEL素子用微粒子蛍光体

    中村真澄, 三浦登, 松本皓永

    日本セラミックス協会 2012年年会  2012.3  日本セラミックス協会

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  • キュリー温度シフトによる無機EL用チタン酸バリウム高誘電率厚膜の作製

    椿尚之, 三浦登, 松本皓永

    日本セラミックス協会 2012年年会  2012.3  日本セラミックス協会

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  • 等価回路モデルを用いたGaN-HEMTのスイッチング特性比較

    南智也,井手利英,清水三聡,三浦登

    第59回応用物理学関係連合講演会  2012.3  応用物理学会

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  • カーボンナノチューブ含有ポリイミド非線形光導波路とBCB導波路の異種接続ハイブリッド化作製技術の開発

    正影淳行,片浦弘道,三浦登,榊原陽一

    第59回応用物理学関係連合講演会  2012.3  応用物理学会

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  • Pr0.002(Ca0.6Sr0.4)0.997TiO3ペロブスカイト蛍光体薄膜の非線形導電現象

    池上 敬一,陸 明,大野 龍蔵,米川 公博,三浦登,高島浩

    第59回応用物理学関係連合講演会  2012.3 

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  • Nonlinear Electrical Current Observed for Thin Films based on a Light-Emitting Perovskite-Type Oxide Pr0.002(Ca0.6Sr0.4)0.997TiO3 Directly Sandwiched by Electrodes

    Keiichi Ikegami, Lu Ming, Ryuzoh Ohno1, Kimihiro Yonekawa, Noboru Miura, Hiroshi Takashima

    The 21st MRS-Japan ACademic Symposium  2011.12  The Material Research of Japan

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  • Nonlinear Electrical Properties of Thin Films of a Light-Emitting Perovskite-Type Oxide Pr0.002(Ca0.6Sr0.4)0.997TiO3

    Keiichi IKEGAMI1, LU Ming1, Ryuzoh OHNO2, Kimihiro YONEKAWA, Noboru MIURA and Hiroshi TAKASHIMA

    International Union of Materials Research Societies (IUMRS) International Conference Asia  2011.9 

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  • Nonlinear Electrical Properties of Thin Films ofa Light-Emitting Perovskite-Type Oxide Pr0.002(Ca0.6Sr0.4)0.997TiO3

    Keiichi IKEGAMI, LU Ming, Ryuzoh OHNO, Kimihiro YONEKAWA, Noboru MIURA, Hiroshi TAKASHIMA

    International Union of Materials Research Societies (IUMRS) International Conference Asia  2011.9 

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  • CaSrTiO3:Pr単層膜EL素子の発光特性

    米川公博, 大野龍蔵, 三浦登, 高島浩, 池上敬一

    日本セラミックス協会 第24回秋季シンポジウム  2011.9  日本セラミックス協会

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  • チタン酸バリウム厚膜誘電体を用いた分散型無機EL素子の検討

    椿尚之, 三浦登, 松本皓永, 中村真澄, 岩田祐麿

    日本セラミックス協会 第24回秋季シンポジウム  2011.9  日本セラミックス協会

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  • Theoretical study of GaN and SiC schottky barrier diode

    T. Minami, T. Ide, H. Chonan, M. Shimizu, N. Miura

    2011.3 

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  • Fabrication of Single-Mode Nonlinear Optical Waveguide Including Carbon Nanotube Using Channel-Pouring Method

    T. Masakage, R. Kaji, E. Itoga, K. Nakanishi1, H. Kataura, M. Mori1, N. Miura, Y. Sakakibara

    2011.3 

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  • AC EL from ZnS:Mn Powder

    2011.2 

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  • High luminance inorganic EL sheets basd on "peel-off" process

    Naoyuki Tsubaki

    15th International workshop on inorganic and organic electroluminescence  2010.9  St-petersburg State Institute of Technology

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  • Electroluminescence from SrTiO3: Pr, Al epitaxial thin films

    2010.9 

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  • セラミックシートを用いた高輝度EL素子

    三浦登, 椿尚之

    光電相互変換 第125委員会 第209回研究会  2010.8  日本学術振興会

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  • BaAlF5:Eu Electroluminescent Devices Prepared by Two-targets Pulsed-Electron-Beam Evaporation

    2010.3 

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  • Si doped AlN:Eu Thin-Film EL Devices Prepared by Sputtering Methoed

    2010.1 

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  • BaAL2S4:Eu EL Devices Prepared by DC-Reactive-Sputtering

    2010.1 

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  • Continual Challenge in The Development of Inorganic Phosphor based EL Devices

    International Workshop on Field Emitter and Semiconductor Materials and Devices  2010.1  Research Institute of Electronics, Shizuoka University

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  • BaTiO3誘電体シート上の薄膜EL素子

    井手大輔, 石間孝郎, 三浦登, 松本皓永, 中野鐐太郎

    第48回セラミックス基礎科学討論会  2010.1  日本セラミックス協会基礎科学部

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  • Low-Electric-Field-Driving Electroluminescence in ((Ca0.6Sr0.4)0.997Pr0.002)Ti3 and SrTiO3 perovskite Films

    H. Takashima, N. Miura, Y. Inaguma, K. Ueda, and M. Itoh

    The 16th International Display Workshops (IDW' 09)  2009.12  ITE, SID

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  • 物理計測のための面発光素子

    第5回学際領域における分子イメージングフォーラム  2009.11  宇宙航空研究開発機構(JAXA)

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  • Continual Challenge in The Development of Electroluminescent Devices

    International Symposium for Phosphor Materials 2009 in Niigata (The Phosphor Safari)  2009.11 

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  • Improvement of the Phosphor Performance for BaAl2S4:Eu Blue-emitting Thin-films with Fluoride Compounds

    RunHong Guo*, Noboru Miura, Hironaga Matsumoto and Ryotaro Nakano

    The 11th Asian Symposium on Information Display (ASID’09)  2009.10  Sun Yat-sen University Hong Kong University of Science and Technology Ministry of Science and Technology of China Department of Information Industry of Guangdong Province

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  • Electroluminescence in perovskite oxide (Ca0.6Sr0.4)TiO3:Pr thin films with BeTiO3 insulatino layers

    2009.9 

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  • Preparation of thick-film dielectric sheets for EL devices

    2009.9 

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  • BaAl2S4:Eu electroluminescence devices prepared by DC reactive sputtering

    2009.9 

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  • Photoluminescence properties of β-FeSi2 thin-film orepared by pulsed laser deposition

    2009.9 

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  • Study of BaAl2S4:Eu EL devices Using Thick-Dielectric Film

    2009.9 

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  • Perceptibility of environmental sounds by earphone wearers listening to pop and rock music

    Kazuhiro Hara, Kaoru Ashihara

    2009.6 

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  • Electroluminescence in perovskite oxide (Ca0.6Sr0.4)TiO3:Pr thin films

    2009.3 

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  • Study of BaAl2S4:Eu EL Devices Using Thick Dielectric Film

    2009.1 

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  • Inorganic Electroluminescence from ZnS Based Phosphors

    2008.12 

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  • High-Luminance from Localized Emission Center Phosphor in Powder-Type EL Device

    T.Higuchi, Y.Matsuura, and T.Muramatsu・

    The 15th International Display Workshops  2008.12 

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  • ELディスプレイ・EL照明の可能性

    日本電子材料技術協会 第45回秋季講演大会  2008.11 

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  • 白金パラジウム酸化物薄膜の電気特性と光学特性の評価

    岩井裕貴, 中川晃一, 三浦登, 松本節子, 中野鐐太郎, 松本皓永

    第49回真空に関する連合講演会  2008.10  日本真空協会

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  • WO3-Bi2O3混合薄膜の作製と評価

    中川晃一, 三浦登, 松本節子, 中野鐐太郎, 松本皓永

    第49回真空に関する連合講演会  2008.10  日本真空協会

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  • 無機EL素子材料と発光デバイスの特性改善

    日本セラミックス協会 第21回秋季シンポジウム  2008.9 

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  • Ti系ペロブスカイト型酸化物蛍光体エピタキシャル薄膜の作製と透明性

    高島浩, 手塚裕之, 蛯名武雄, 植田和茂, 稲熊宣之, 島田康平, 三浦登, 伊藤満

    日本セラミックス協会 第21回秋季シンポジウム  2008.9  日本セラミックス協会

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  • New Trial of Inorganic EL Devices

    14th International Workshop on Inorganic and Organic Electrolumienescence & 2008 International Conference on the Science and Technology of Emissive Displays and Lightings  2008.9 

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  • Fluorine Effects on BaAl2S4:Eu Blue-Emitting Phosphors

    Noboru Miura, Guo Runhong, Nobutoshi Kishi, Hironaga Matsumoto and Ryotaro Nakano

    14th International Workshop on Inorganic and Organic Electrolumienescence & 2008 International Conference on the Science and Technology of Emissive Displays and Lightings  2008.9 

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  • Pr添加Ti系ペロブスカイト型酸化物エピタキシャル薄膜の赤色蛍光特性(II)

    高島浩, 植田和茂, 稲熊宣之, 三浦登, 伊藤満

    第69回応用物理学会学術講演会  2008.9  応用物理学会

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  • フッ素添加による青色蛍光体BaAl2S4:Euの特性変化

    郭潤洪, 三浦登, 松本皓永, 中野鐐太郎

    第69回応用物理学会学術講演会  2008.9  応用物理学会

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  • 有機/無機ハイブリッド構造を有するZnS:Cu,Cl直流キャリヤ注入EL素子

    蘇傑, 三浦登, 松本皓永, 中野鐐太郎

    第69回応用物理学会学術講演会  2008.9  応用物理学会

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  • BaAl2S4:Eu成膜時のZnS添加効果

    磯村亮輔, 岸伸年, 三浦登, 松本皓永, 中野鐐太郎

    第69回応用物理学会学術講演会  2008.9  応用物理学会

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  • 無機ELの新しい試み

    光電相互変換第125委員会「本委員会201回・EL分科会第33回」  2008.7  日本学術振興会

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  • BaAl2S4:Eu 青色蛍光体膜におけるフッ素化合物の添加効果

    光電相互変換第125委員会「本委員会201回・EL分科会第33回」  2008.7  日本学術振興会

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  • 無機ELディスプレイの最新動向と展望

    有機デバイス研究会 第72回研究会  2008.4 

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  • スパッタリング法による Si 添加 AlN:Eu薄膜の作製

    福士貴宣, 三浦登, 松本皓永, 中野鐐太郎・第55回応用物理学関係連合講演会 29p-ZJ-4

    2008.3 

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  • 反応性同時スパッタリングにより作製した白金パラジウム混合酸化物薄膜の光学特性

    岩井祐貴, 中川晃一, 三浦登, 松本節子, 中野鐐太郎, 松本皓永・第55回応用物理学関係連合講演会 28a-M-11

    2008.3 

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  • ペロブスカイトSrTiO3:Pr,Alエピタキシャル薄膜の作製と蛍光特性

    島田康平, 高島浩, 稲熊宜之, 三浦登・第55回応用物理学関係連合講演会 28p-ZD-3

    2008.3 

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  • レーザアブレーション法により作製したβ-FeSi2薄膜の表面構造および結晶性評価

    三村智博, モハマド・ザキル・ホセイン, 福田朋宏, 三浦登, 植草新一郎・第55回応用物理学関係連合講演会 29p-C-12

    2008.3 

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  • ZnS D-Aペア蛍光体にIII-V族化合物を添加した無機EL素子の作製(4)

    渋沢壮一, 竹安祐二, 三浦登, 松本皓永, 中野鐐太郎・第55回応用物理学関係連合講演会 28a-ZD-11

    2008.3 

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  • Local Structure around Ba2+ and Eu2+ Ions in Blue Luminescent BaAl2S4:Eu Thin Films

    2008.1 

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  • Luminescence GdF3 co-doped BaAl2S4:Eu blue-emitting phosphors

    2008.1 

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  • B添加によるBaAl2S4:Eu青色蛍光体の特性改善

    郭潤洪, 顔将帥, 三浦登, 松本皓永, 中野鐐太郎 ・ 静岡大学

    2008.1 

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  • Local Structure around Ba2+ and Eu2+ Ions in Blue Luminescent baAl2S4:Eu Thin-Films

    Shinji Okamoto, T.Honma, Katsu Tanaka, Runhong Guo, and Noboru Miura, The 14th International Display Workshop (IDW'07), Sapporo Convention Center

    2007.12 

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  • 無機発光材料の現状と課題

    第84回金属材料研究会(日本電子材料技術協会)

    2007.11 

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  • Nドープ酸化タングステン薄膜の作製と評価

    中川晃一, 三浦登, 松本節子, 中野鐐太郎, 松本皓永・第48回真空に関する連合講演会(学習院大学)

    2007.11 

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  • Inorganic EL phosphors based on ZnS doped with some elements

    2007.11 

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  • Characterization of β-FeSi2/Si hetero-junction diodes prepared with laser-ablated Fe films.

    2007.9 

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  • Effects on GdF3 co-doping for BaAl2S4:Eu blue-emitting phosphors

    2007.9 

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  • (Sr, Ca, Ba)TiO3: Pr, Alの組成比における蛍光特性の変化

    (明治大学・産業技術総合研究所)○島田康平, (産業技術総合研究所)高島浩, 王瑞平, (明治大学)三浦登, (東京工業大学)伊藤満・日本セラミックス協会 第20回秋季シンポジウム(2007年)

    2007.9 

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  • Local structure of Ba and doped Eu in Inorganic Electroluminescent Thin Film BaAl2S4:Eu studied by XAFS

    2007.9 

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  • Discussion on high-luminance ZnS Phosphor for electroluminescent devices

    2007.9 

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  • Preparation of Platinum and Palladium Composite Oxide Thin Films Deposited by Reactive Sputtering

    2007.9 

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  • Optical Properties of Au-doped V2O5 Thin Films Prepared by Reactive Sputtering

    2007.9 

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  • Optical Properties of Molybdenum Oxide Thin Films Prepared by Reactive Sputtering

    2007.9 

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  • Substrate Temperature Dependence of Bi2O3-TiO2 Thin Films Prepared by RF Sputtering Method

    2007.9 

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  • Electroluminescence from ZnS D-A Pair Type Phosphors Doped with Ⅲ-V Compounds (3)

    2007.9 

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  • Effects on AlF3-doping during the deposition of BaAl2S4:Eu thin-film phosphors

    2007.9 

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  • 無機ELデバイスの新展開・ディスプレイと照明応用 〜蛍光体技術・構造・作製技術〜

    総評会館4階 サイエンス&テクノロジー株式会社主催

    2007.8 

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  • High Luminance Phosphors for Electroluminescent Devices

    26th Electronic Materials Symposium (EMS-26) Laforet Biwako, Shiga July 5th (Thu)

    2007.7 

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  • Flux Effects on BaAl2S3:Eu,F Blue-Phosphors

    Runhong Guo, Noboru Miura, Hironaga Matsumoto, and Ryotaro Nakano・Society for Information Display 2007 International Symposium

    2007.5 

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  • RT CNT Single Electron Transistor Formed by RF Plasma

    2007.3 

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  • Ternary Compound Phosphors for Electroluminescent Displays

    Asia Diaplay 2007, Shanghai, Mar.15

    2007.3 

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  • Electroluminescence from ZnS D-A Pair Type Phosphors Doped with III-V Compounds (2)

    2007.3 

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  • Present Status of Distributed and Thin-Film Inorganicc EL

    2007.2 

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  • Luminescent Properties of ZnS Doped with Ⅲ-Ⅴ Semiconductors

    2007.1 

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  • Optical Properties of Electron-Beam-Evaporated BaAl2S4:Eu Thin-films

    2007.1 

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  • FPD(フラットパネルディスプレイ)最新技術と材料開発 無機ELディスプレイ

    神奈川科学技術アカデミー(KAST)

    2007.1 

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  • 無機ELの動向と今後の展望

    乳業会館C会議室 (ISS産業科学システムズ)

    2006.12 

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  • Effects of V2O5 interlayer on ZnS:Mn-ACTFEL Devices

    13th International Workshop on Inorganic and Organic Electroluminescence joint with 2006 International Conference on the Science and Technology of Emissive Display and Lighting, September 21, 2006, JEJU, Korea Jong Hyuk Kang, Dong Chin Lee, Noboru Miura, Sum Jin Yun, and Duk Young Jeon

    2006.9 

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  • Phosphor Studies for Color EL Devices

    13th International Workshop on Inorganic and Organic Electroluminescence joint with 2006 International Conference on the Science and Technology of Emissive Display and Lighting, September 21, 2006, JEJU, Korea

    2006.9 

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  • 無機ELの動向と今後の展開

    トリケップス・セミナー

    2006.9 

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  • Electroluminescence from ZnS D-A Pair Type Phosphors Doped with III-V Compounds

    2006.8 

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  • Red-Emitting CuAl2S4:Mn Thin-Films for Electroluminescent Devices

    2006.8 

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  • 無機ELの開発および材料・素子のトレンドと製造技術

    情報機構(大田区産業プラザ)

    2006.7 

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  • Capacitance Temperature Sensor Made of Ferroelectric (Sr1-xCax)TiO3 for Cryogenic Temperatures

    2006.5 

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  • 無機ELの新展開 〜動向と今後の展望

    ISS産業科学システムズ 5月25日

    2006.5 

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  • 無機EL素子の作製方法と最新動向

    4月6日 ULVAC

    2006.4 

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  • 無機ELの今後の開発の動向

    照明学会 世代高品位ディスプレイ研究調査委員会 研究会 3月17日

    2006.3 

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  • Thermal-Diffusion of The Atoms in Laser-Abrated B-FeSi2 Thin-Films

    2006.3 

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  • 反応性スパッタリング法によるV添加Ag酸化物薄膜の光学的特性

    ○張 善齢,中川晃一,三浦 登,松本節子,中野鐐太郎,松本皓永・ 第53回応用物理学学術連合講演会(武蔵工業大)

    2006.3 

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  • 反応性スパッタリング法による白金酸化物薄膜の光学的特性

    ○岩井祐貴,中川晃一,津田俊幸,三浦 登,松本節子,中野遼太郎,松本皓永 第53回応用物理学会関係連合講演会(2006春 武蔵工業大)

    2006.3 

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  • 無機ELの原理・作製と開発動向

    3月22日 星和電機

    2006.3 

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  • 無機ELの最新動向

    3月8日 大日本印刷

    2006.3 

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  • 多元同時反応性スパッタリング法による不純物添加W酸化物薄膜のフォトクロミック特性

    ○中川晃一,三浦 登,中野鐐太郎,松本節子,松本皓永・ 第53回応用物理学学術連合講演会(武蔵工業大)

    2006.3 

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  • 無機EL素子の現状と開発動向

    2月13日 半導体エネルギー研究所

    2006.2 

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  • 無機ELの新展開〜動向と今後の展望

    産業科学システムズ 主催

    2006.2 

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  • Chalcopyrite型蛍光体薄膜の発光特性

    大藤潤二郎, 川崎大也, 三浦登, 松本皓永, 中野鐐太郎 電子情報通信学会 -発光型・非発光型ディスプレイ研究会ー 1月27日

    2006.1 

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  • 無機EL用蛍光体の開発現状・課題と発光制御

    サイエンス&テクノロジー株式会社 主催

    2005.12 

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  • Full Color Inorganic Electroluminescent Devices

    2005.11 

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  • 無機ELの魅力と展望

    三菱化学株式会社

    2005.10 

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  • 紫外発光ZnF2:Gd薄膜EL素子におけるバッファ層の効果

    第66会応用物理学会学術講演会 徳島大学 富田晋平, 三浦登, 松本皓永, 中野鐐太郎

    2005.9 

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  • 青色発光BaAl2S4:Eu蛍光体のX線解析

    第66会応用物理学会学術講演会 徳島大学 郭潤洪, 南雲健介, 川崎大地, 三浦登, 松本皓永, 中野鐐太郎

    2005.9 

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  • 反応性スパッタリング法によるPd酸化物薄膜の光学的特性(2)

    第66会応用物理学会学術講演会 徳島大学 岩井祐貴, 小林弘典, 中川晃一, 岩井祐貴三浦登, 松本皓永, 松本節子, 中野鐐太郎

    2005.9 

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  • 反応性スパッタリング法によるTa添加Y酸化物薄膜の光学的特性

    第66会応用物理学会学術講演会 徳島大学 岩井智也, 三浦登, 松本皓永, 松本節子, 中野鐐太郎

    2005.9 

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  • レーザアブレーション法により作製したβ-FeSi2薄膜の長時間アニーリング効果

    第66会応用物理学会学術講演会 徳島大学 青木邦年, モハマド ザキルホセイン, 福田朋宏, 植草新一郎, 三浦登

    2005.9 

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  • 反応性スパッタリング法により作製した窒素添加W酸化物薄膜の光学的特性と電子状態解析(2)

    第66会応用物理学会学術講演会 徳島大学 中川晃一, 三浦登, 松本節子, 中野鐐太郎, 松本皓永

    2005.9 

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  • Bi2O3-TiO2スパッタリング薄膜における熱処理効果

    第66会応用物理学会学術講演会 徳島大学 白石佑一, 三浦登, 松本節子, 中野鐐太郎, 松本皓永

    2005.9 

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  • エレクトロルミネッセンス実用化に向けての三元硫化物蛍光体

    第66会応用物理学会学術講演会 徳島大学 多元系機能材料研究会企画シンポジウム

    2005.9 

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  • 反応性スパッタリング法による酸化銀薄膜の光学的特性

    第66会応用物理学会学術講演会 徳島大学 張善齢, 中川晃一, 三浦登, 松本節子, 中野鐐太郎, 松本皓永

    2005.9 

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  • 無機ELデバイスの開発動向

    セミナー「無機ELデバイスの基礎と応用」 日 時: 平成17年8月31日(水) 13:00〜17:15 株式会社クラレ つくば研究所

    2005.8 

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  • 無機ELにおける応用製品の開発動向と今後の展望

    2005.6.9

    2005.6 

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  • Optical Properties and Annalysis of Electronic Structure of W Oxide Thin Films Doped with Nitrogen Deposited by Reactive Sputtering

    2005.3 

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  • Optical and Electrical Properties of Bi2O3-TiO2 Thin Films Deposited by Sputtering.

    2005.3 

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  • Optical and Electrical Properties of Y Oxide Thin Films deposited by Reactive Sputtering

    2005.3 

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  • BaAl2S4:Eu Thin Films Prepared by Sputtering

    2005.3 

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  • White emitting TFEL devices using hypercomplex sulfide phosphors

    2005.1 

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  • BaAl2S4:Eu thin-films prepared by rf Sputtering

    2005.1 

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  • Thin-Film Electroluminescent Devices Prepared by Laser Annealing Method

    2005.1 

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  • 無機EL素子における熱処理技術の新展開

    独立行政法人 日本学術振興会 光電相互変換第125委員会 第186回研究会(12月13日月曜日, 明治大学駿河台キャンパス)

    2004.12 

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  • ELデバイスの技術課題と展望

    2004 NTT-AT 技術セミナ

    2004.9 

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  • Optical properties of impurity-doped Pd oxide thin-films deposited by reactive sputtering

    2004.9 

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  • Optical properties and electronic structures analysis of impurity-doped oxide thin films

    2004.9 

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  • Annealing Study for Color EL devices

    International conference of Organic and Inorganic Electroluminescence

    2004.9 

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  • 薄膜・真空技術が支えるフラットパネルディスプレイ事情

    JEOL 第5回 高機能膜ユーザーズミーティング

    2004.8 

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  • SID'04 報告会 -Emissive Display<Inorganic EL, Phosphors>ー

    電子情報通信学会技術研究報告 Vol.104, No.172, p15-17. (EID2004-5)

    2004.7 

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  • Color Phosphors for Inorganic Electroluminescent Devices

    Society for Information Display 2004 International Symposium

    2004.5 

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  • 最新動向をふまえた<無機・有機>ELディスプレイの特性比較と将来予測 〜特性評価・生産性・寿命予測・各種用途への可能性等〜

    情報機構セミナー

    2004.4 

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  • ZnGa2S4:Mn thin-film electroluminescent devices fabricated by magnetron sputtering

    2004.3 

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  • Electrical Properties of β-FeSi2/Si Hetero-Diode Improved by Pulsed Laser Annealing

    ◎土屋圭一*(大学院生), 三浦登(専任講師), 松本皓永(教授), 中野鐐太(教授), 植草新一郎(教授)

    2003.12 

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  • 無機ELディスプレイ

    平田機工

    2003.10 

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  • Photoluminescence from β-FeSi2 Thin Film Grown by a Pulsed Laser Deposition Method.

    Shin-ichiro Uekusa, Kentaro Momma, Masahiro Yamamoto, Keiichi Tsuchiya and Noboru Miura

    2003.10 

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  • エキシマレーザを用いたプラスチックフィルム上への無機薄膜EL素子の作製

    ◎森本和紀*(大学院生), 二宮俊英*(大学院生), 三浦登(専任講師), 松本皓永(教授), 中野鐐太郎(教授)

    2003.9 

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  • Red emitting inorganic electroluminescent devices including color-changing-mediums technique

    2003.9 

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  • Laser annealed barium titanate thin films prepared by sol-gel processing

    2003.9 

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  • Red emitting ZnGa2S4:Mn thin-film EL devices

    2003.9 

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  • Optical and electric properties of Cr oxide thin films doped with Zr deposited by reactive sputtering

    2003.8 

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  • optical properties and electronic structures analysis of impurity-doped W oxide thin films

    2003.8 

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  • Optical properties of Pd oxide thin films deposited by reactive sputtering

    2003.8 

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  • Optical properties of Zr-Mn oxide thin films

    2003.8 

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  • 無機エレクトロルミネッセンスとその研究動向

    富士写真フィルム

    2003.4 

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  • ELの最新動向

    サンリッツ

    2003.4 

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  • Fabrication of superconducting tunnel junction X-ray detectors by full dry process

    2003.3 

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  • Energy dependence of spatial distribution in STJ X-ray detector

    2003.3 

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  • 無機エレクトロルミネッセンスとその研究動向

    旭硝子中央研究所

    2003.3 

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  • 無機ELの最新動向

    双葉電子工業

    2003.3 

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  • Optical properties of W oxide thin films doped with V deposited by reactive sputtering

    2003.3 

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  • 無機ELディスプレイの開発動向・無機EL材料の開発動向

    産業科学システムズ

    2003.3 

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  • Improvement of crystalinity and electrical characteristics for excimer-laser annealed β-phase iron disilicide

    2003.3 

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  • A pulsed laser ablation method grown β-FeSi2 thin-films using buffer layer

    2003.3 

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  • High color purity green electroluminescent devices using CaAl2S4:Eu

    2003.3 

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  • 無機ELディスプレイの技術開発動向

    情報機構

    2003.1 

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  • High color purity green electroluminescent devices used Eu2+ doped CaAl2S4

    2003.1 

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  • 次世代平面 ディスプレイ の展望 -無機EL-

    社団法人 映像メディア学会

    2003.1 

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  • Characteristics of A-(Mg,Zn)-S (A=Ca,Sr,Ba) for EL phosphor

    2003.1 

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  • Mn2+ doped (Zn,Mg)Al2S4 electroluminescent phosphor

    2003.1 

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  • Composition of β-FeSi2 thin-films grown by a pulsed laser deposition method

    植草新一郎(教授), ◎山本真弘*(大学院生), 土屋圭一*(大学院生), 三浦登(専任講師)

    2002.12 

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  • New II-Y2-S4 phosphors for electroluminescent devices

    ◎川西光宏*(大学院生), 三浦登(専任講師), 松本皓永(教授), 中野鐐太郎(教授)

    2002.12 

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  • 無機EL ディスプレイの開発動向

    静岡大学電子研究所

    2002.12 

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  • 11th international workshop on electroluminescence and 2002 international conference on the science and technology of emission displays and lightings -Inorganic Electroluminescence-

    2002.12 

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  • 有機EL vs 無機ELディスプレイ

    情報機構

    2002.10 

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  • Mn2+ and Eu2+ doped barium zinc sulfide phosphors

    ◎中川亮*(大学院生), 木下雄一*(大学院生), 川西光宏*(大学院生), 三浦登(専任講師), 松本皓永(教授), 中野鐐太郎(教授)

    2002.9 

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  • Water quantitative analysis of blue-emitting BaAl2S4:Eu thin-films

    2002.9 

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  • Optical properties of W-Nb oxide thin films deposited by reactive sputtering

    2002.9 

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  • Improvement of β-FeSi2 crystalline preparing a pulsed laser abration method by using the long-time and high temperature annealing

    2002.9 

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  • Electrical structures analysis of impurity-doped Mo oxide thin films

    2002.9 

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  • Optical properties of nickel-titanium oxide thin films deposited by sputtering

    2002.9 

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  • Fabrication of superconducting tunnel junctions with lift-off technique

    2002.9 

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  • Phosphor Technology for Electroluminescent Display

    Philips

    2002.9 

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  • Possibiity of RGB emission by Eu2+ ion doped IIa-IIIb2S4 phosphors for full color inorganic electroluminescent displays

    ◎川西光宏*(大学院生), 小野義明*(大学院生), 中川亮*(大学院生), 三浦登(専任講師), 松本皓永(教授), 中野鐐太郎(教授)

    2002.9 

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  • Mn2+ and Eu2; doped barium zinc sulfide phosphors

    2002.7 

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  • Possibility of fuRGB Emission by Eu2+ ion doped IIa-IIIb2-S4 phosphors for full color electroluminescent displays

    2002.7 

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  • Recent status and prospects of inorganic EL phosphors

    2002.6 

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  • 無機ELディスプレイの開発動向と他方式ディスプレイとの比較・検討

    産業科学システムズ

    2002.5 

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  • 無機ELディスプレイの動作原理と材料・素子の開発、評価

    技術情報協会

    2002.4 

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  • Green emitting CaAl2S4:Eu thin-film EL devices

    2002.3 

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  • Surface segregation of β-FeSi2/Si prepared by a pulsed laser ablation method

    2002.3 

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  • BaAl2S4:Eu thin films deposited by laser ablation

    2002.3 

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  • Electronic structure of Molybdenum oxide films calculated by DV-Xα method

    2002.3 

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  • Distribution properties of refractive index of zirconium oxide thin films deposited by sputtering

    2002.3 

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  • Zn-doping effect on CaIn2S4:Eu phosphors

    2002.3 

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  • 無機ELディスプレイの開発動向

    総合技術センター

    2002.3 

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  • Study of blue-emitting BaAl2S4:Eu Thin-Film by thermal desorption spectroscopy

    2002.3 

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  • BaAl2S4:Eu thin-films prepared by laser ablation technique

    2002.1 

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  • BaMgAl10O17:Eu thin-films prepared by laser ablation

    2002.1 

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  • Annealig process of blue-emitting BaAl2S4:Eu thin-films

    2002.1 

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  • Ternary & multinary sulfide phosphors for electroluminescence

    2001.12 

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  • 無機ELディスプレイの開発動向と今後の課題

    産業科学システムズ

    2001.12 

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  • Polymer one-dimentional photonic crystal by physical vapor deposition

    2001.11 

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  • BaAl2S4:Eu Phosphors for Full-Color EL Display

    Miura, Noboru

    2001.11 

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  • Preparation of Efficient Blue Emitting BaAl2S4:Eu Thin Films without High Temperature Annealing

    ◎川西光宏*(大学院生), 三浦登(専任講師), 松本皓永(助教授), 中野鐐太郎(教授)

    2001.11 

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  • Blue-emitting BaAl2S4:Eu thin-films prepared by anealingless process

    2001.9 

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  • Electrical characteristics of AlN TFEL devices

    2001.9 

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  • Optical and electrical properties of V oxide thin films doped with Zr deposited by reactive sputtering

    2001.9 

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  • Analysis on annealing process of blue-emitting BaAl2S4:Eu thin-film by thermal desorption spectroscopy

    2001.9 

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  • Electrical and optical properties of nickel oxide thin-films deposited by reactive sputtering

    2001.9 

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  • Optical properties of Mo oxide films doped with V deposited by reactive sputtering

    2001.9 

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  • BaMgA110017:Eu thin-films prepared by PLD method

    2001.9 

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  • Laser-ablated β-FeSi2/Si hetero diode

    2001.9 

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  • Electrical properties of β-FeSi2/Si hetero diode prepared by a pulsed laser ablation method

    2001.3 

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  • Effects of Ti in ZrO2, Nb2O5 Thin Films Deposited by Reactive Sputtering

    2001.3 

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  • Optical Properties of Hf Doped V Oxide Thin Films Deposited by Reactive Sputtering(Ⅱ)

    2001.3 

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  • Optical Properties of Mo Oxide Films Deposited by Reactive Sputtering

    2001.3 

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  • Photoluminescence Properties of BaAl2S4: Eu Crystals

    2001.3 

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  • Optical Properties for Sputtered Ti Doped Hf Oxide Thin-Films(Ⅲ)

    2001.3 

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  • Electrical Characteristics of BaAl2S4: Eu EL Devices

    2001.1 

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  • White Emitting undoped Organic Electroluminescent Devices used Super-Thin-Film Layer

    2001.1 

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  • BaAl2S4: Eu Thin Film Electroluminescent Devices Prepared by Conventional Beam Euaporation Method

    2001.1 

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  • Composition and Luminescene Properties of Blue-Emitting BaAl2S4:Eu Thin-Films

    ◎田中功*(NHK技研・研究員), 井上陽司*(NHK技研・研究員), 岡本信治*(NHK技研・研究員), 田中克*(NHK技研・研究員), 和泉佳孝*(NHK技研・研究員), 川西光宏*(大学院生), 三浦登(専任講師), 松本皓永(助教授), 中野鐐太郎(教授)

    2000.12 

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  • Crystallization of Thin-Film Phosphors by New Annealing Technique

    川西光宏*(大学院生), 三浦登(専任講師), 松本皓永(助教授), 中野鐐太郎(教授)

    2000.12 

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  • Blue-Emitting BaAl2S4: Eu2+ Thin-Film EL Devices

    ◎Miura, Noboru

    2000.12 

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  • β-FeSi2 thin-films grown by a pulsed laser Deposition method

    植草新一郎(教授), ◎渡辺靖治*(大学院生), 三浦登(専任講師), 會田康弘*(大学院生)

    2000.11 

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  • BaAl2S4:Eu Thin-Film EL Devices Prepared by Pulsed Laser Ablation Technique

    ◎木下雄一*(大学院生), 三浦登(専任講師), 松本皓永(助教授), 中野鐐太郎(教授)

    2000.11 

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  • Deposition of BaAl2S4:Eu Phosphor Thin Films by Conventional EB Evaporation

    2000.9 

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  • New High-Luminance blue-emitting TFEL devices(Ⅲ)

    2000.9 

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  • Theoritical calculation of Refractive indices for hybrid oxide thin films

    2000.9 

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  • Optical Properties of Hf Doped V Oxide Thin Films Deposited by Reactive Sputtering

    2000.9 

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  • Effects of Ti in Zro2 Thin Films Deposited by Reactive Sputtering

    2000.9 

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  • Growth mechanism of β-FeSi2 thin-films prepared by pulse-laser-ablation method

    2000.9 

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  • BaAl2S4: Eu Thin-Film EL Devices Prepared by Pulsed Laser Ablation Technique

    2000.9 

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  • Composition Dependence of Bandgap energy in β-FeSi2 thin-films prepared by laser-ablation method

    2000.9 

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  • Optical Properties for Sputtered Ti Doped Hf Oxide Thin-Films(II)

    2000.9 

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  • β-FeSi2 thin-films grown by a pulsed laser ablation method

    植草新一郎(教授), ◎渡辺靖治*(大学院生), 三浦登(専任講師), 會田康弘*(大学院生)

    2000.8 

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  • Composition and Optical Properties of Blue-Emitting BaAl2S4:Eu2+ Electroluminescent Thin Films

    2000.5 

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  • AlN thin-film EL devices with SrTiO3 insulator

    2000.3 

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  • An XPS study of BaAl2S4:Eu thin films prepared by switching electron-beam evaporation with two targets

    2000.3 

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  • Effects of Ti in Nb25 films deposited by reactive sputtering

    2000.3 

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  • New high luminance blue-emitting TFEL devices (II)

    2000.3 

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  • Optical properties for sputterd Ti doped Hf oxide thin-films

    2000.3 

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  • Effects of buffer layer doped with impurities on electroluminescence II

    2000.3 

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  • β-FeSi2 thin-films grown by laser ablation method

    2000.3 

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  • PrxSr1 -xTiO3 thin-film EL devices

    2000.3 

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  • Optical properties of BaAl2S4:Eu thin-films prepared by switching electrom-beam evaporation with two targets

    2000.3 

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  • Report on 5th international display phosphor conference -Inorganic-

    2000.2 

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  • Effects of buffer layer for TFEL devices

    2000.1 

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  • Eu2+ doped BaAl2S4 blue emitting thin-film EL devices

    2000.1 

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  • Blue-emitting BaAl2S4:Eu2+ thin-film electroluminescent devices

    1999.12 

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  • Blue Emitting BaAl2S4:Eu TFEL Devices Prepared by Two Targets Pulse Electron Beam Evaporation

    ◎川西光宏*(大学院生), 三浦登(専任講師), 松本皓永(助教授), 中野鐐太郎(教授)

    1999.12 

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  • CaIII2S4:Ce Electroluminescent Devices Prepared by Pulse Deposition Technique

    ◎三浦登(専任講師), 川西光宏*(大学院生), 松本皓永(助教授), 中野鐐太郎(教授)

    1999.11 

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  • Electroluminescence of BaAl2S4:Eu phosphor thin-films

    1999.11 

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  • New high brightness blue-emitting TFEL devices

    1999.9 

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  • Optical properties for reactive sputtered Ta25:Ti films

    1999.9 

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  • PrxSr1 -xTiO3 thin film EL devices deposited by RF magnetron sputtering

    1999.9 

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  • SrF2 thin film electroluminescence devices

    1999.9 

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  • AlN thin film EL devices doped with rare-earth

    1999.9 

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  • Effects of buffer layer doped with impurities on electroluminescence

    1999.9 

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  • Efficient blue-emitting CaGa2S4:Ce thin-film electroluminescent devices prepared by two targets pulse electron beam evaporation method

    1999.1 

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  • CaAl2S4:Ce thin-film EL devices prepared by two targets pulse electron-beam evaporation

    1999.1 

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  • CaF2:Eu 薄膜EL素子

    1998.9 

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  • Thin-film EL devices of PrxSr1-xTiO3

    1998.9 

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  • CaAl2xGa2(1-x)S4:Ce thin-film EL devices prepared by two point EB evaporation method

    1998.9 

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  • Electroluminescence of Al1-xGaxN thin-films doped with rare-earth ions

    1998.3 

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  • Optical properties of Ta2O5:Ti films deposited by sputtering (II)

    1998.3 

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  • CaAl2S4S4:Ce thin-film EL devices prepared by two point EB evaporation method

    1998.3 

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  • Optical properties of Hf1+xTi1-xO4 films prepared by He gas mixed RF magnetron sputtering (II)

    1998.3 

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  • CaGa2S4:Ce Electroluminescent Devices Prepared by The Two Target Electron-Beam Evaporation

    ◎三浦豊(助手), 横山高士*(大学院生), 松本皓永(助教授), 中野鐐太郎(教授)

    1997.11 

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  • Optical properties of Hf1+xTi1-xO4 films prepared by He gas mixed RF magnetron sputtering

    1997.10 

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  • Thin-film EL devices of ITO:Ln

    1997.10 

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  • Irradiation He-Cd laser on Zn1-xMgxS thin-film EL devices

    1997.10 

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  • Electroluminescence of AlN thin-films doped with rare-earth ions

    1997.10 

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  • Optical properties of Nb25:Ti films deposited by sputtering

    1997.10 

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  • CaGa2S4:Ce thin-film EL devices prepared by two point EB evaporation method

    1997.10 

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  • Effects of He gas during sputtering for Hf1+xTi1-xO4 thin-films.

    1997.3 

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  • Optical properties for Ta2O5:Ti sputterd thin-films

    1997.3 

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  • Zn1-xMgxF2 thin-film EL devices

    1997.3 

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  • Effects of He gas on deposition of sputtered ITO thin-films

    1996.9 

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  • Infrared emission of ZnS thin films doped with rare-earth ions

    1996.9 

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  • Optical properties of Hf1+xTi1-xO4 films by RF sputtering

    1996.9 

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  • Electroluminescent Spectra for Tb3+ Doped Zn1-xCdxS Thin-Films

    ◎三浦豊(助手), 並木輝彦*(大学院生), 松本皓永(専任講師), 中野鐐太郎(教授)

    1996.8 

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  • Relaxation for Tb3+ ion in Zn1-xCdxS:TbOF thin film EL devices

    1996.3 

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  • ZnO-In2O3 thin-films prepared by magnetron sputtering

    1996.3 

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  • Preparation of Zr1+xTi1-xO4 films by RF co-sputtering

    1996.3 

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  • Several Trial for New Phosphors of Electroluminescent Devices

    ◎三浦豊(助手), 松本皓永(専任講師), 中野鐐太郎(教授)

    1995.11 

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  • Zn1-xMgxS:Eu thin-film EL devices

    1995.8 

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  • Temperature dependence of CdF2 thin-film electroluminescent devices (II)

    1995.3 

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  • Thin-film electroluminescent devices having Ln2O2S host

    1995.3 

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  • Applicattion of the IIb-III2-VI4 compounds for thin-film electroluminescent devices

    1995.3 

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  • Photoluminescence for SrCa1-y-xBaxF2:Eu single crystals

    1995.3 

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  • Electroluminiscent Devices of Electron-Beam-Evaporated II-III2-VI4 Hosts

    ◎三浦豊(助手), 小椋彰*(大学院生), 大橋克旬*(大学院生), 並木輝彦*(大学院生), 松本皓永(助手), 中野鐐太郎(教授)

    1994.10 

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  • Application of the IIb-IIIb2VI4 compounds for thin-film electroluminescent devices

    1994.9 

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  • Eu concentration dependence of evcitation and emission spectra in BaF2:Eu single crystals

    1994.3 

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  • 5D3->5D4 relaxation for Tb3+ ion in ZnxCd(1-x)S:Tb3+ EL devices

    1994.3 

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  • Thin-film electroluminescent devices doped with Tm3+ ion

    1994.1 

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  • Blue-emitting CaGa2S4:Ce thin-film electroluminescent devices

    1993.12 

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  • Temperature dependence of CdF2 thin-film electroluminescent devices

    1993.9 

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  • Electroluminescent spectra for ZnS(1-x)Sex:Tm3+ thin-film EL devices

    1993.9 

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  • Blue-emitting La2O2S:Tm thin-film electroluminescent devices

    1993.9 

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  • Blue-emitting thin film electroluminescent devices of CaF2:Eu and CaGa2S4:Ce

    1993.9 

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  • Electroluminescence spectra for rare-Doped ZnS1-xSex thin films

    ◎三浦豊(助手), 小川貴由*(大学院生), 小椋彰*(大学院生), 小林秀幸*(大学院生), 松本皓永(助手), 中野鐐太郎(教授)

    1993.8 

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  • Electroluminescence spectra for rare-Doped Zn1-xCdxS thin films

    ◎三浦豊(助手), 小川貴由*(大学院生), 大橋克旬*(大学院生), 松本皓永(助手), 中野鐐太郎(教授)

    1993.8 

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  • Rare Earth Doped Thin Film Electroluminescent Devices Using the Fluoride Emitting Layer

    ◎三浦豊(助手), 小川貴由*(大学院生), 須田敏史*(大学院生), 松本皓永(助手), 中野鐐太郎(教授)

    1993.5 

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  • Thin-film electroluminescent devices using the fluoride emitting layers

    1993.1 

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  • Thin-film electroluminescence of several compounds doped with Tm3+ ion

    1992.12 

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  • Thin-film electroluminescent devices having CdF2 host

    1992.9 

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  • Time resolved emission spectra for ZnS:Tm3+ thin film EL devices

    1992.9 

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  • Band-gap energy dependence of host materials for electroluminescent spectra

    1992.9 

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  • Band-Gap Energy Dependence of Host Materials for Electroluminescent Spectra

    ◎三浦豊*(研究員), 小川貴由*(大学院生), 佐々木祟*(大学院生), 石川哲夫*(大学院生), 岡俊行*(大学院生), 松本皓永(助手), 中野鐐太郎(教授)

    1992.5 

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  • Band-gap energy dependence for the EL spectra in Tm ion doped thin-films

    1992.1 

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  • ZnF2 thin-film electroluminescent devices doped with rare-earth ions

    1991.11 

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  • Effects of UV light irradiation on ZnS:TbFx thin-film EL devices (II)

    1991.10 

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  • Blue-emitting thin-film electroluminescence of several host materials doped with Tm3+ ion

    1991.10 

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  • Blue-emitting CaF2:Eu thin-film electroluminescent devices

    1991.10 

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  • ZnF2 thin-film electroluminescent devices doped with rare-earths

    1991.10 

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  • Dependence of applied pulse width for emission intensity in ZnS:Er,YbFx thin-film EL devices

    1991.10 

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  • Effect of UV light irradiation on ZnS thin-film electroluminescent films

    1991.9 

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  • Effects of UV light irradiation on ZnS:TbFx thin-film EL devices

    1991.3 

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  • Electroluminescence in ZnS:Tm3+ thin-films

    1991.3 

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  • Electroluminescence in Y2O2S:Eu thin-films

    1990.9 

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  • Transient behavior in ZnS:Mn and ZnS:Tb thin-films

    1990.9 

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  • Transient Behavior of Photoluminescence and Electroluminescence in ZnS Thin Film Doped with Tb3+ Ion

    ◎三浦登*(大学院生), 山本陽一郎*(大学院生), 大畑浩*(大学院生), 松永浩永(助手), 中野鐐太郎(教授)

    1990.6 

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  • Photoluminescence of ZnS:TbFx Thin-films

    1990.3 

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  • Time resolved emission spectra for SrS:Ce thin-film electroluminescent devices

    1990.3 

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  • Transient Characteristics of Emission in ZnS:Mn Thin Film Electroluminescent Devices

    ◎三浦登*(大学院生), 松永浩永(助手), 中野鐐太郎(教授)

    1989.10 

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  • Transient characteristics in ZnS:TbFx thin-film electroluminescent devices

    1989.9 

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  • Time responses of ZnS:TbFx thin-film electroluminescent devices at different heattreatment temperature

    1989.4 

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  • Red emitting electroluminescence in ZnS:EuFx thin-film coactivated by Li+1 ion

    1988.10 

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  • Time Resolved Emission Spectra in ZnS thin-film Electroluminescent Devices

    Ryotaro Nakano, Hironaga Matsumoto, *Noboru Miura, Norio Sakagami, Jun Shimada and Tadao Endo

    1988.10 

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  • Heattreatment temperature dependence of emission layer in time-resolved emission spectra of ZnS:TbFx thin film electroluminescent devices

    1988.10 

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  • Transient characteristics of emission in ZnS:TbF3 TFEL devices (III)

    1988.3 

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  • Transient characteristics of emission in ZnS:TbF3 TFEL devices (II)

    1987.10 

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Industrial property rights

  • 酸化物蛍光体エピタキシャル薄膜

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    Application no:2007-332106 

    Patent/Registration no:5182857 

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  • 蛍光体薄膜およびその製造方法ならびにELパネル

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    Application no:2003-326736 

    Announcement no:2004-137480 

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  • 酸化物ペロブスカイト薄膜EL素子

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    Application no:2009-554320 

    Patent/Registration no:5093694 

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  • 蛍光体材料、蛍光体薄膜及びその製造方法、発光素子、並びに、EL素子

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    Application no:特願2004-106934 

    Announcement no:2005-290196 

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  • Phosphor thin-film, its fabrication process and EL panel

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    Application no:2002-274516 

    Announcement no:2002-274516 

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  • Phosphor and EL Panel

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    Application no:2002-36075 

    Announcement no:2003-238953 

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  • Treated Phosphor, making method, thin-film making apparatus, and EL device

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    Application no:2000-113671 

    Announcement no:2001-294852 

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  • アルミネート青色発光蛍光体材料とそれを用いて構成した青色発光薄膜エレクトロルミネッセンス素子

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    Application no:200-081483 

    Announcement no:2001-262140 

    Patent/Registration no:3987263 

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  • 分散型無機EL素子の製造方法、分散型無機EL素子及びそれを備えた照明装置

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    Application no:特願2010-40763 

    Announcement no:特開2011-175936 

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  • Treated phosphor, making method, thin film making apparatus, and EL device

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    Application no:USA 09/708678 

    Announcement no:US 2003/0087129 

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  • Phosphor and EL panel

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    Application no:USA 10/364377 

    Announcement no:US 2003/0152804 

    Patent/Registration no:US 6942932 B2 

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  • Phosphor thin-film, manufacturing method of the same, and electroluminescent panel

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    Application no:USA 10/664923 

    Announcement no:US 2004/0206935 

    Patent/Registration no:US 6939482 B2 

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  • Perovskite oxide thin-film EL element

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    Application no:12/735793 

    Patent/Registration no:US 8193704 B2 

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Works

  • 進化する無機ELディスプレイの要素技術ー赤色蛍光体の特性向上

    電子技術, 月号, 日

    2003.2

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  • 進化する無機ELディスプレイの要素技術 ー赤色蛍光体の特性向上

    電子技術 2月号 (日刊工業新聞社)

    2003.2

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  • 無機ELが有機ELを追い抜く!?青色材料改善で実用ステージへ

    日刊工業新聞社・月刊Trriger 2001年0月号 p34-36

    2001.10

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Awards

  • Society For Information Display (SID) Special Recognition Award

    2003  

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  • 日本学術振興会 光電相互変換委員会 業績賞

    2002  

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  • 平成12年度 蛍光体賞

    2000  

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  • The 6th International Display Workshops Outstanding Poster Paper Award

    1999  

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Research Projects

  • 無機EL用硫化物発光材料のメカニズム解明およびその製造方法に関する研究

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    Grant type:Competitive

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  • 映像情報表示デバイスのコンビナトリアル最適化法に関する研究

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    Grant type:Competitive

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  • 薄膜誘電体に関する研究

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    Grant type:Competitive

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  • Stacked Multi-Color ディスプレイパネル

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    Grant type:Competitive

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  • 薄膜EL素子用赤色蛍光体の開発

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    Grant type:Competitive

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  • 新規フラットパネルディスプレイに関する研究

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    Grant type:Competitive

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  • 新規発光機構に基づく低電圧駆動無機EL素子

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    Grant type:Competitive

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  • 無機EL用硫化物発光材料のメカニズム解明およびその薄膜化に関する研究

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    Grant type:Competitive

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  • バリウムチオアルミネート系蛍光体のEB蒸着成膜プロセスの研究

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  • 酸化物・窒化物・硫化物またはそれらの化合物薄膜蛍光体に関する研究

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    Grant type:Competitive

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  • Electrical Properties for Carbon Nano Tube

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    Grant type:Competitive

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  • 直流低電圧駆動電界発光素子の研究

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    Grant type:Competitive

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  • 高分子誘電体薄膜に関する研究

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    Grant type:Competitive

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  • Functionable Thin Film

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    Grant type:Competitive

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  • Thin Film Emissive Devices

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    Grant type:Competitive

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  • 無機ELに関する研究

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    Grant type:Competitive

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  • 有機エレクトロルミネッセンス素子に関する研究

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    Grant type:Competitive

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  • Licence and Development of BaAl2S4:Eu Phosphor Tecnology

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    Grant type:Competitive

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  • Organic Thin Film Devices

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    Grant type:Competitive

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  • Cabon Nano Tube

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    Grant type:Competitive

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  • Photonic Crystal

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    Grant type:Competitive

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  • "Kankyo" Semiconductor

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    Grant type:Competitive

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  • Thin Film Electroluminescent Display

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  • Oxide Electronics

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Social Activities

  • NEDO技術委員

    2013.9 - 2015.7

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  • NEDO技術員

    2010.9 - 2011.3

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  • 経済産業省 平成15年度中小企業革新等対策補助金(創造技術研究開発事業)指導者

    Role(s): Advisor

    2003.4 - 2004.4

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  • 全国中小企業団体中央会 平成14年度コーディネート活動支援事業 異業種交流会「シフト21」研究指導

    Role(s): Advisor

    2002.11 - 2004.3

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